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HfO2 Based FeFET and FTJ for Ferroelectric Memory Centric 3D LSI Towards Low Power and High Density Storage and AI Applications

M. Saitoh, R. Ichihara, M. Yamaguchi, K. Suzuki, K. Takano, K. Akari, K. Takahashi, Y. Kamiya, K. Matsuo, Y. Kamimuta, K. Sakuma, K. Ota, S. Fujii

DOI
10.17023/0aat-sq82
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    Length: 00:20:31

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