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Staggered Metallization with Air Gaps for Independently Tuned Interconnect Resistance and Capacitance

K.L. Lin, M. Anders, R. Bristol, M. Christenson, G. Elbaz, B. Holybee, H. Kaul, M. Kobrinsky, R. Krishnamurthy, M. Reshotko, H.J. Yoo

  • EDS
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    Length: 00:20:13

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